Intrinsic Point Defects, Impurities, and Their Diffusion in Silicon

Lieferzeit: Lieferbar innerhalb 14 Tagen

320,99 

Computational Microelectronics

ISBN: 3709172047
ISBN 13: 9783709172049
Autor: Pichler, Peter
Verlag: Springer Verlag GmbH
Umfang: xxi, 554 S., 40 s/w Illustr., 554 p. 40 illus.
Erscheinungsdatum: 01.11.2012
Auflage: 1/2012
Produktform: Kartoniert
Einband: Kartoniert
Artikelnummer: 6599271 Kategorie:

Beschreibung

Basically all properties of semiconductor devices are influenced by the distribution of point defects in their active areas. This book contains the first comprehensive review of the properties of intrinsic point defects, acceptor and donor impurities, isovalent atoms, chalcogens, and halogens in silicon, as well as of their complexes. Special emphasis is placed on compiling the structures, energetic properties, identified electrical levels and spectroscopic signatures, and the diffusion behavior from experimental and theoretical investigations. In addition, the book discusses the fundamental concepts of silicon and its defects, the electron system, diffusion, thermodynamics, and reaction kinetics which form the scientific basis needed for a thorough understanding of the text. Therefore, the book is able to provide an introduction to newcomers in this field up to a comprehensive reference for experts in process technology, solid-state physics, and simulation of semiconductor processes.

Herstellerkennzeichnung:


Springer Verlag GmbH
Tiergartenstr. 17
69121 Heidelberg
DE

E-Mail: juergen.hartmann@springer.com

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