Beschreibung
In this book we have discussed the preparation and characterization of CdO thin films using RF reactive magnetron sputtering technique. The deposition parameters such as oxygen partial pressure, substrate temperature and film thickness are optimized for producing good quality films. Systematic characterization of as deposited and annealed films has been discussed from the crystal structure, surface morphology, film composition, optical and electrical properties. The films prepared under optimized conditions are tested for gas sensing characteristics towards ammonia gas.
Autorenporträt
Dr. Anil Kumar Gadipelly did his M.Sc from University of Hyderabad and completed his Ph.D in Physics from Osmania University, Hyderabad. His area of research includes metal oxide based thin films for gas sensing and photovoltaic applications. Prof. M.V.Ramana Reddy is currently working in Osmania University.
Herstellerkennzeichnung:
OmniScriptum SRL
Str. Armeneasca 28/1, office 1
2012 Chisinau
MD
E-Mail: info@omniscriptum.com
