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Semiconductor Dry Etching Technology

ISBN: 3527346686
ISBN 13: 9783527346684
Autor: Lill, Thorsten
Verlag: Wiley-VCH GmbH
Umfang: XIV, 284 S., 150 s/w Illustr., 150 Illustr.
Erscheinungsdatum: 21.04.2021
Auflage: 1/2021
Format: 1.5 x 24.5 x 17
Gewicht: 584 g
Produktform: Kartoniert
Einband: Kartoniert
Artikelnummer: 9823273 Kategorie:

Beschreibung

This practical guide, written by an author actively involved in corporate R&D, provides in-depth information on etching technologies that are used in the semiconductor industry, helping engineers to select the right technologies for their task and to design etching processes.

Autorenporträt

Thorsten Lill is a Vice President for Emerging Etch Technologies and Systems at Lam Research, the market leader in etching tools for the semiconductor industry. He has been working in the field of plasma, radical, thermal, ion beam and plasma etching since 1995. He has a Ph.D. in Physics from the Albert-Ludwigs-University in Freiburg, Germany and was a post doc at the Argonne National Laboratory. He has a track record in developing commercially successful etching equipment for the semiconductor industry. He published 85 articles and 66 patents in the field. Thorsten Lill holds a certificate in Entrepreneurship and Innovation from Stanford University.

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