Beschreibung
In this book, have four stage: - The first stage: the used silicon wafer n-type and then sample preparation 2x2 cm2 and then remove the oxide layer by HF solution. The second stage: the photo-electrochemical etching method was used to produce PSi at different etching times (15, 20, 25 and 30) min, and with the different power density (7, 13, 18, 25) mW/cm2. The third stage: have been Fabrication of (AuNPs /meso PSi)for gas sensor, and then the described the (AuNPs / PSi ) by Porosity and layer thickness, SEM, PL, FTIR, X-Ray. The Fourth stage: the Measuring the sensor Performance for CO2 and CO gas sensor.
Autorenporträt
Amer Badr Dheyab was born in Baghdad, Iraq in 1987. He received B.S degree in laser physics from University of Technology in 2011 and received M.Sc degree in nanotechnology from University of Technology in 2017. He is currently working as researcher physicist at Labs in the Laser and Optoelectronic center in Ministry of Science and Technology.
Herstellerkennzeichnung:
OmniScriptum SRL
Str. Armeneasca 28/1, office 1
2012 Chisinau
MD
E-Mail: info@omniscriptum.com
