Beschreibung
This book is the most comprehensive book on ion sources as part of ion implantation technology, a newly established basic technology for microelectronic device processing. It appeals to physicists, engineers and advanced students active in ion implantation and ion beam physics.
Herstellerkennzeichnung:
Springer Verlag GmbH
Tiergartenstr. 17
69121 Heidelberg
DE
E-Mail: juergen.hartmann@springer.com




































































































