Factors Leading to Low Enrollment Patterns in Kenyan Youth Polytechnics

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49,90 €

ISBN: 3330027606
ISBN 13: 9783330027602
Autor: Ronoh, Richard
Verlag: LAP Lambert Academic Publishing
Umfang: 96 S.
Erscheinungsdatum: 02.06.2017
Auflage: 1/2017
Format: 0.7 x 22 x 15
Gewicht: 161 g
Produktform: Kartoniert
Einband: Kartoniert
Artikelnummer: 2470068 Kategorie:

Beschreibung

What went wrong with our Technical and Vocational training? Is it our curriculum, training culture, low value attached to such training, or lack of appropriate information? In Kenya, the large number of primary school leavers cannot be accommodated fully in the available vacancies in the secondary schools. Some of those who cannot proceed to secondary school may join the micro-small scale enterprise while the remaining are expected to join the youth polytechnics for skill development. However, a trend seems to have emerged where the YPs in the recent past have recorded low enrollment. This research aimed at carrying out a comprehensive investigation of the factors that may have led to low enrollment patterns in youth polytechnics in Kericho, Bureti and Bomet districts. Simple random sampling technique was used to select 180 YP students, 63 instructors, 90 parents, 90 YP graduates and 90 youths not enrolled from the neighborhoods of YPs. 18 YP Principals and 18 Deputy Principals were selected for interview. This gave a sample of 513 respondents. The study was both quantitative and qualitative. Data was collected using questionnaires, interviews, discussions and observations.

Autorenporträt

Ronoh is currently teaching at Kibabii University, Kenya, in the Department of Computer Science. He teaches electronics, signals and systems, signal processing, communication systems and computer hardware courses. Currently his research interests include Technology convergence systems, TVET provision challenges and Mobile phone usage.

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