Beschreibung
This book is the result of a NATO Advanced Research Workshop held in Vimeiro, Portugal, in May 1992. The objectives of this Workshop were: i) to promote exchange of knowledge between experts in various fields of discharge modeling, plasma diagnostics and microwave plasma applications; ii) to assess the state-of-the-art in this field from a multidisciplinary viewpoint; iii) to identify basic points needing clarification and to estab lish basic guidelines for future research; iv) to compare the properties of microwave dis charges to those of RF discharges, as plasma sources for specific applications. Most of the contributors to this book are well known scientists in the field of mi crowave discharge sources, modeling, diagnostics and applications. The book provides an up-to-date review in this field which should be useful for both the fundamentalists and those using these systems in applications such as surface treatment and elemental analysis. We are gmteful to a number of organizations for providing the fmancial assistance that made the Workshop possible. Foremost is the NATO Scientific Affairs Division, which provided the major contribution for the Workshop. In addition, the following Por tuguese sources made contributions: Instituto Nacional de Investiga~iio Cientifica, Junta Nacional de Investiga~iio Cientifica e Tecnologica, Centro de Electrodinamica da Univer sidade Tecnica de Lisboa, Instituto Superior Tecnico, Banco Nacional Ultmmarino, and Regiiio de Turismo do Oeste.
Inhaltsverzeichnis
Surface Wave Discharges: Waves Propagation in Bounded Plasmas; C. Boisse-Laporte. Strongly Damped Surface Waves in Plasmas; G. Lister. Microwave Plasma Sources: Surface Wave Plasma Sources; Z. Zakrzewski, et al. ECR Plasma Sources; R. Wilhelm. Diagnostics: Optical Diagnostic for High Electron Density Plasmas; M. van de Sanden. Use of Emissive Probes in HF Plasmas; F.M. Dias. Modeling: Kinetic Modeling of Microwave Discharges; C.M. Ferreira. Time-Dependent EEDFs in Molecular Gases; M. Capitelli; et al. Light Sources: Applications of Microwave Discharges to High Power Light Sources; J. Waymouth. Applications: Semiconductor Processing Applications of Microwave Plasmas; J. Paraszczak, J. Heidenreich. Ion Bombardment Effects in Dual Microwave/Radio Frequency Plasmas; M. Wertheimer, L. Martinu. 24 additional articles. Index.
